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Major Breakthrough In Chip Manufacturing: IBM
 
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Major Breakthrough In Chip Manufacturing: IBM
 
The secret of IBM's breakthrough lies in how the IBM scientists’ moved the self-assembly process from the laboratory to a production manufacturing environment in a way that can potentially yield millions of chips with consistent, high-performance results.
 
 
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Thursday, May 03, 2007 In his bestselling science-fiction novel Prey, Michael Crichton described a technique using which scientists learnt the process of developing nanomachines at a faster rate, taking lessons from nature. They mimicked bacterias to create new machines. Now, IBM is also taking some classes from nature. The company is working on the first-ever application of a breakthrough self-assembling nanotechnology to conventional chip manufacturing, borrowing a process from nature to build the next-generation computer chips.





The natural pattern-creating process that forms seashells, snowflakes and enamel on teeth has been harnessed by IBM to form trillions of holes to create insulating vacuums around the miles of nano-scale wires packed next to each other inside each computer chip. A vacuum is believed to be the ultimate insulator for what is known as wiring capacitance, which occurs when two conductors, in this case adjacent wires on a chip, sap or siphon electrical energy from one another, generating undesirable heat and slowing the speed at which data can move through a chip.

In chips running in IBM labs using the technique, the researchers have proven that the electrical signals on the chips can flow 35 per cent faster, or the chips can consume 15 per cent less energy compared to the most advanced chips using conventional techniques.

This new form of insulation, commonly referred to as 'airgaps' by scientists, is a misnomer, as the gaps are actually a vacuum, absent of air. The technique deployed by IBM causes a vacuum to form between the copper wires on a computer chip, allowing electrical signals to flow faster, while consuming less electrical power. The self-assembly process enables the nano-scale patterning required to form the gaps; this patterning is considerably smaller than current lithographic techniques can achieve.

"This is the first time anyone has proven the ability to synthesise mass quantities of these self-assembled polymers and integrate them into an existing manufacturing process with great yield results," said Dan Edelstein, IBM fellow and chief scientist, self-assembly airgap project. "By moving self-assembly from the lab to the fab, we are able to make chips that are smaller, faster and consume less power than existing materials and design architectures allow."

The IBM-patented self-assembly process moves a nanotechnology manufacturing method that had shown promise in laboratories into a commercial manufacturing environment for the first time, providing the equivalent of two generations of Moore's Law wiring performance improvements in a single step, using conventional manufacturing techniques.

The self-assembly process already has been integrated with IBM's manufacturing line in East Fishkill, New York and is expected to be fully incorporated in IBM’s manufacturing lines and used in chips in 2009. The chips will be used in IBM's server product lines and thereafter for chips IBM builds for other companies.





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