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Scandinavia Semicon And Material Science Sectors Supported
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Thursday, July 12, 2012:
ST. PETERSBURG, USA: The recent Plasma-Therm advanced plasma processing workshop held at Lund University provided fundamental and advanced technology used in the semiconductor device and materials research. Attendees from Scandinavia participated a full day of presentations focusing on applying plasma etching and deposition to fabricating electronic, photonic, bioscience, and nano-scale devices and structures.
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This workshop is one of many held at centers of excellence throughout the world by Plasma-Therm, a leading semiconductor plasma processing equipment supplier.
Dr. Ivan Maximov, Head of Nano-process Laboratory, Deputy Director of the Lund Nano Lab, commented: "We were very happy to host the Plasma-Therm Technical Workshop on Fundamentals of Plasma Processing in Lund. It provided us with a good introduction into the basics of plasma processing and at the same time it was very useful for these who already work with plasma etching or deposition. The workshop has undoubtedly improved our understanding of reactive ion etching processes of III-Vs and Si and associated PECVD processes, which we used in our labs on a daily basis."
"Plasma processing continues to play a critical role in extending the boundaries of semiconductor device fabrication and material engineering," said Dr. David Lishan, Plasma-Therm Principal Scientist and workshop director.
"The workshop format addresses a strong need to provide fundamental and advanced etching and deposition concepts to the academic and industrial communities. The value of these workshops is confirmed by the high interest levels of graduate students as well as senior researchers and process engineers. We are pleased to sponsor these events that encourage potential collaboration across diverse disciplines."
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